Model No: ASRM100 Film Thickness Mapping Measurement System
Features:
· Easy to set up and operate with Window based software
· Various types of geometry substrate up to 300x300mm or 300mm in diameter
· Various types of mapping pattern such as linear, polar, square or arbitrary coordinates
· Advanced optics and rugged design for best system performance
· Array based detector system to ensure fast measurement
· Map film thickness and Refractive Index up to 5 layers
· System comes with comprehensive optical constants database and library
· Include commonly used recipes
· Advanced Software allows user to use either NK table, dispersion or effective media approximation (EMA) for each individual film.
· Upgradeable to AMSP (Microspectrophotometer) mapping system with pattern recognition, or Large Spot for mapping over patterned or featured structure (with Zonerage Model)
· Apply to many different type of substrates with different thickness
· 2D and 3D output graphics and user friendly data management interface with statistical results
System Configuration:
· Model: ASRM100-300
· Detector: CCD Array with 2048 pixels
· Light Source: High Power DUV and DC regulated Tungsten-Halogen
· Light Delivery: Optics
· Stage1: Black Anodized Aluminum Alloy Vacuum chuck holds 200 mm wafer
· Communication: USB & RS232
· Software
· Measurement Type: Film thickness, reflection spectrum, refractive index
· Computer: Intel Core 2 Duo Processor with 200GB Hard drive and DVD+RW Burner plus 19 LCD Monitor
· Power: 110 240 VAC /50-60Hz, 3 A
· Dimension: 14(W) x 20(D) x 14(H)
· Weight: 100 lbs
· Warranty: One year labor and parts
Specifications:
Wavelength range: 250 to 1050 nm
Spot Size: 500 µm to 5mm
Sample Size: up to 300 mm in diameter
Substrate Size: up to 50mm thick
Number of Layers*: Up to 5 films
Measurable thickness range*: 10 nm to 50 µm
Measurement Time: 2ms - 1s /site typical
Positional Repeatability: ~1 µm
Accuracy*: better than 0.5% (comparing with ellipsometry results for Thermal Oxide sample by using the same optical constants)
Repeatability*: < 2? (1 sigma from 50 thickness readings at center for 1500 ? Thermal SiO2 on Si Wafer)
Options:
Additional Models with Wavelength Extension to DUV or NIR Range: SRM100D: 190nm - 850nm
ASRM400: 900nm - 1700nm
ASRM500: 400nm - 1700nm
Customized size: Available
Large Spot Accessories for featured structure measurement
Small spot accessories for highly non uniform samples
