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Model No: ASR300
Spectroscopic Reflectometer & Film Thickness Measurement System
Features
System Configurations
Specifications
Options
Applications                                                        
Application Examples
Features:
· Easy to set up
· Easy to operate with Window based software
· Advanced optics design for best system performance
· Array based detector system to ensure fast measurement
· Uniquely designed light source for better intensity stability
· There are four ways to adjust light intensity:
Power output adjustment by knob from power supply
Insert a filter into filter slot at light output exit port
Beam size adjustment
Integration time adjustment in Detector from TFProbe software
· Measure film thickness and Refractive Index up to 5 layers
· Allow to acquire reflection, transmission and absorption spectra in milliseconds 
· Capable to be used for real time or in-line thickness, refractive index monitoring
· System comes with comprehensive optical constants database and library
· Advanced Software allows user to use either NK table, dispersion or effective media approximation (EMA) for each individual film.
· Upgradeable to AMSP (Microspectrophotometer) system, ASRM Mapping system, Multiple channel system, Large Spot for · direct measurement over patterned or featured structure
· Apply to many different type of substrates with different thickness
· Various accessories available for special configurations such as running measurement over the curve surface
· 2D and 3D output graphics and user friendly data management interface
System Configuration:
· Model: SR300
· Detector: CCD Array with 2048  pixels
· Light Source: High stability and long lifetime Halogen
· Light Delivery: Fiber Optics
· Stage: Black Anodized Aluminum Alloy with Easy Adjustment for sample height, 200mmx200mm size
· Software:
· Communication: USB to Computer
· Measurement Type: Film thickness, reflection spectrum, refractive index
· Computer needed: P3 above with minimum 50 MB space
· Power: 110– 240 VAC /50-60Hz, 1.5 A
· Warranty: One year labor and parts
Specifications:
· Wavelength range: 400 to 1100 nm
· Spot Size: 500 µm to 5mm
· Sample Size: 200x200mm or 200 mm in diameter
· Substrate Size: up to 50mm thick
· Measurable thickness range*: 20 nm to 50 µm
· Measurement Time: 2 ms minimum
· Accuracy*: better than 0.5% (comparing with ellipsometry results for Thermal Oxide sample by using the same optical constants)
· Repeatability*: < 1 ? (1 sigma from 50 thickness readings for 1500 ? Thermal SiO2 on Si Wafer)
Options:                                                                                                                
· Transmission Fixture for Transmission and Absorption Measurement (ASR300RT)
· Micro spot for measuring small area down to 5 µm size (AMSP300)
· Multiple Channel for simultaneously measurement at multiple locations (ASR300xX)
· Mapping uniformity over 200 or 300 mm wafer (ASRM300-200 /300)
Applications:                                                                                                          
· Semiconductor fabrication (PR, Oxide, Nitride..)
· Liquid crystal display (ITO, PR, Cell gap…..)
· Forensics, Biological films and materials
· Inks, Mineralogy, Pigments, Toners
· Pharmaceuticals, Medial Devices
· Optical coatings, TiO2, SiO2, Ta2O5…..
· Semiconductor compounds
· Functional films in MEMS/MOEMS
· Amorphous, nano and crystalline Si
Application Examples:                                                                                           
1. Measured thicknesses for three layers Nitride-Oxide-Nitride on Glass
2. Measured Thickness for thick coating
3. Measured Reflection Spectrum and Thickness for Nano-crystalline Si
1. System configuration and Specifications subject to change without notice
2. * Film property, surface quality and layer stack dependent
3. Customized system available for special applications
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