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Model No. AMSP100
Microspectrophotometer and Film Thickness Measurement System
Features:
· Easy to operate with Window based software
· Advanced DUV optics and rugged design for highest uptime and the best system performance
· Array based detector system to ensure fast measurement
· Affordable, portable and small footprint table top design
· Measure film thickness and Refractive Index up to 5 layers over micron size region
· Allow to acquire reflection, transmission and absorption spectra in milliseconds
· Capable to be used for real time spectra, thickness, refractive index monitoring
· System comes with comprehensive optical constants database and library
· Advanced Software allows user to use either NK table, dispersion or composite model (EMA) for each individual film
· Integrated Vision, spectrum, simulation, film thickness measurement system
· Apply to many different type of substrates with different thickness up to 200mm size
· Deep ultraviolet light allows to measure film thickness down to 20Å
· 2D and 3D output graphics and user friendly data management interface
· Advanced Imaging software for dimension measurement such as angle, distance, area, particle counting and more
· Various options available to meet special applications
System Configuration:
· Model: AMSP100RTM
· Detector: CCD Array with 2048 pixels
· Light Source: High power DUV-Visible
· Automatic Stage: Black Anodized Aluminum Alloy with 5”x3” net travel distance and 1µm resolution, program controlled
· Motorized Z focus drive and X-Y-Z joystick
· Long Working Distance Objectives: 4x, 10x, 15x(DUV), 50x
· Communication: USB
· Measurement Type: Reflection/Transmission spectra, Film thickness/refractive index and feature dimensions
· Computer: Intel Core 2 Duo Processor with 200GB Hard drive and DVD+RW Burner plus 19” LCD Monitor
· Power: 110– 240 VAC /50-60Hz, 3 A
· Dimension: 16’x16’x18’ (Table top setup)
· Weight: 120 lbs total
· Warranty: One year labor and parts
Specifications:
· Wavelength range: 250 to 1000 nm
· Wavelength Resolution: 1nm
· Spot Size: 100µm (4x), 40µm (10x), 30µm (15x), 8µm (50x)
· Substrate Size: up to 20mm thick
· Measurable thickness range*: 20Å to 25 µm
· Measurement Time: 2 ms minimum
· Accuracy*: better than 0.5% (comparing with ellipsometry results for Thermal Oxide sample by using the same optical constants)
· Repeatability*: < 2 ? (1 sigma from 50 thickness readings for 1500 ? Thermal SiO2 on Si Wafer)
Options:
· Wavelength extension to to Further DUV or NIR range
· Higher power DUV optics for smaller spot size
· Customized configuration for special applications
· Heating and Cooling Stage for dynamic study
· Optional stage size holding samples up to 300mm
· Higher wavelength range resolution down to 0.1nm
· Various filters for special applications
· Add-on accessories for fluorescence measurement
· Add-on accessories for Raman applications
· Add-on accessories for polarizing applications
Applications:
· Semiconductor fabrication (PR, Oxide, Nitride..)
· Liquid crystal display (ITO, PR, Cell gap…..)
· Forensics, Biological films and materials
· Inks, Mineralogy, Pigments, Toners
· Pharmaceuticals, Medial Devices
· Optical coatings, TiO2, SiO2, Ta2O5…..
· Semiconductor compounds
· Functional films in MEMS/MOEMS
· Amorphous, nano and crystalline Si
Application Examples:
1. Measured Transmission Spectra from Three Filters
2. Measured Film Thickness
3. Measured Reflection Spectrum over a MEMS Mirror
4. Mapped Thickness Uniformity over 4" wafer
1. System configuration and Specifications subject to change without notice
2. * Film property, surface quality and layer stack dependent
3. Customized system available for special applications
Microspectrophotometer
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