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Model No: ASR100
Spectroscopic Reflectometer & Film Thickness Measurement System
Features:
· Easy to set up
· Easy to operate with Window based software
· Advanced optics design for best system performance
· Array based detector system to ensure fast measurement
· Measure film thickness and Refractive Index up to 5 layers
· Allow to acquire reflection, transmission and absorption spectra in milliseconds 
· Capable to be used for real time or in-line thickness, refractive index monitoring
· System comes with comprehensive optical constants database and library
· Advanced  Software allows user to use either NK table, dispersion or effective media approximation (EMA) for each individual film.
· Upgradeable to AMSP (Microspectrophotometer) system, ASRM Mapping system, Multiple channel system, Large Spot for · direct measurement over patterned or featured structure
· Apply to many different type of substrates with different thickness
· Various accessories available for special configurations such as running measurement over the curve surface
· 2D and 3D output graphics and user friendly data management interface
System Configuration:
· Model: ASR100R
· Detector: CCD Array with 2048  pixels
· Light Source: Combined High Power Deuterium and Halogen
· Light Delivery: Fiber Optics
· Stage: Black Anodized Aluminum Alloy with Easy Adjustment for sample height, 200mmx200mm size
· Communication: USB with computer
· Measurement Type: Film thickness, reflection spectrum, refractive index
· Software:
· Computer needed: P3 above with minimum 50 MB space
· Power: 110– 240 VAC /50-60Hz, 1.5 A
· Warranty: One year labor and parts
Specifications:
· Wavelength range: 250 to 1100 nm
· Spot Size: 500 µm to 5mm
· Sample Size: 200x200mm or 200 mm in diameter
· Substrate Size: up to 50mm thick
· Measurable thickness range*: 2 nm to 50 µm
· Measurement Time: 2 ms minimum
· Accuracy*: better than 0.5% (comparing with ellipsometry results for Thermal Oxide sample by using the same optical constants)
· Repeatability*: < 1A  (1 sigma from 50 thickness readings for 1500 A Thermal SiO2 on Si Wafer)
Options:                                                                                                               
· Transmission Fixture for Transmission and Absorption Measurement (ASR100RT)
· Micro spot for measuring small area down to 5 µm size (AMSP100)
· Multiple Channel for simultaneously measurement at multiple locations (ASR100xX)
· Mapping uniformity over 200 or 300 mm wafer (ASRM100-200 /300)
Applications:                                                                                                     
· Semiconductor fabrication (PR, Oxide, Nitride..)
· Liquid crystal display (ITO, PR, Cell gap…..)
· Forensics, Biological films and materials
· Inks, Mineralogy, Pigments, Toners
· Pharmaceuticals, Medial Devices
· Optical coatings, TiO2, SiO2, Ta2O5…..
· Semiconductor compounds
· Functional films in MEMS/MOEMS
· Amorphous, nano and crystalline Si
Application Examples:                                                                                             
Top
1. Measured thickness for thin Al2O3 film
2. Measured Thickness for thick coating
3. Measured Reflection Spectra for optical Antireflection (AR) Coatings
1. System configuration and Specifications subject to change without notice
2. * Film property, surface quality and layer stack dependent
3. Customized system available for special applications
Features
System Configurations
Specifications
Options
Applications
Application Examples
Spectroscopic Reflectometer
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